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- May 12 : Helyssen to present the planar antenna at the 55th 2012 SVC Annual Technical Conference in Santa Clara, CA on May 1st
- 27.04.12 : "Resonant planar antenna as an inductive plasma source", has been published in Journal of Applied Physics (Vol.111, Issue 8)
- 10.02.12 Fast track communication in Journal of Applied Physics: "Plasma generation by inductive coupling with a planar resonant RF network antenna"
- 2011 : Patents acceptance
Plasma Processing lies at the heart of many industries
Major applications include:
- Integrated Circuit manufacturing
- Sources and display systems (TV sets)
- Solar cells production
- Food packaging application
- Plasma-based lighting systems
- Plasma chemistry
- Environmental and health applications (sterilization)
- Power systems, thrusters (VASIMR)
At the heart of all these applications lie a plasma source. There is a constant need to improve them mainly in two directions : higher process rates thanks to higher plasma densities and larger processing areas.
Larger processing areas have a double interest: it allows to treat more pieces in a single run or to develop new kinds of products