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New article published about deposition of thin silicon films by helyssen ICP plasma source

January 2018May 2019

RF bias to suppress post-oxidation of mc-Si:H films deposited by inductively-coupled plasma using a planar RF resonant antenna

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 Helyssen in the Eurofusion news : “What do fusion and food-packaging have in common?”
The RAID experiment for the investigation of negative ion physics for fusion applications 

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  • The RAID experiment for the investigation of negative ion physics for fusion applications
  • New article published about deposition of thin silicon films by helyssen ICP plasma source
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